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Arc-pulse carbon plasma source.
Diamond-like carbon (DLC) from a high-current pulsed cathodic vacuum arc. Lower friction, lower wear, made from graphite plus energy.
Why pulse?
- Pulses can be counted.
- Peak power can be orders of magnitude above the DC value.
- New process controls: pulse width, frequency, number and ion energy range — for different film microstructures.
- With high-voltage pulse bias it works as an ion source for pure metal ion implantation.
- Higher arc discharge voltage and current raise the ionization rate.
- A cooler cathode means fewer macro particles.
The film: amorphous carbon, tuned.
DLC films are usually amorphous — no dominant crystal lattice — a mix of sp² (graphite) and sp³ (diamond) phases. Hardness and sp³ content can be tuned to the application.
| Type | Hardness | sp³ |
|---|---|---|
| Me-DLC a-C:H:Me | 500–2000 HV | 35% |
| C-DLC a-C:H | 1500–4000 HV | up to 75% |
| ta-C tetrahedral amorphous carbon | 4000–9000 HV | 80–85% |
Friction coefficient against steel: generally 0.05–0.20.
What sets the film properties
- Flux of the deposition method (PVD sputter or evaporation, Pa-CVD)
- Metal and hydrogen content
- sp² : sp³ ratio
- Substrate bias voltage
- Ion energy and ion density
- Substrate temperature
We are open to all kinds of collaboration.
A machine to your specifications, a coating run on your parts, or spares for your source: write with the material, the size and the quantity.
SWISSIMPIANTI Sagl
Via G. Guisan 112
6828 Balerna
Switzerland